The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2010
Filed:
May. 11, 2006
Tomoki Nagai, Tokyo, JP;
Eiji Yoneda, Tokyo, JP;
Takuma Ebata, Tokyo, JP;
Takanori Kawakami, Tokyo, JP;
Makoto Sugiura, Tokyo, JP;
Tsutomu Shimokawa, Tokyo, JP;
Makoto Shimizu, Tokyo, JP;
Tomoki Nagai, Tokyo, JP;
Eiji Yoneda, Tokyo, JP;
Takuma Ebata, Tokyo, JP;
Takanori Kawakami, Tokyo, JP;
Makoto Sugiura, Tokyo, JP;
Tsutomu Shimokawa, Tokyo, JP;
Makoto Shimizu, Tokyo, JP;
JSR Corporation, Tokyo, JP;
Abstract
A radiation-sensitive resin composition is provided which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, a high resolution radiation-sensitive resin composition providing a wide DOF and excelling in LER. Also provided are a polymer which can be used in the composition and a novel compound useful for synthesizing the polymer. The novel compound is shown by the following formula (2), wherein Rrepresents a methyl group, a trifluoromethyl group, or a hydrogen atom, at least one of the Rs represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A represents a divalent organic group or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, Mrepresents a metal ion or an onium cation, m represents an integer of 1 to 3, and p is an integer of 1 to 8.