Tokyo, Japan

Takuma Ebata

USPTO Granted Patents = 7 

 

Average Co-Inventor Count = 3.3

ph-index = 3

Forward Citations = 47(Granted Patents)


Company Filing History:


Years Active: 2010-2013

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7 patents (USPTO):Explore Patents

Title: Takuma Ebata: Innovator in Radiation-Sensitive Resin Technology

Introduction

Takuma Ebata is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of radiation-sensitive resin compositions, holding a total of seven patents. His innovative work has advanced the technology used in various applications, particularly in the realm of materials science.

Latest Patents

Ebata's latest patents include a compound, salt, and radiation-sensitive resin composition. The compound features a partial structure defined by specific chemical formulas, where R represents a hydrogen atom or a hydrocarbon group with 1 to 8 carbon atoms. Additionally, his radiation-sensitive resin composition comprises a resin, a radiation-sensitive acid generator, an acid diffusion controller, and a mixed solvent. This composition is notable for its inclusion of propylene glycol monomethyl ether acetate, which plays a crucial role in its functionality.

Career Highlights

Throughout his career, Takuma Ebata has worked with notable companies such as JSR Corporation and Central Glass Company, Limited. His experience in these organizations has allowed him to refine his expertise in resin technology and contribute to groundbreaking innovations.

Collaborations

Ebata has collaborated with esteemed colleagues, including Tomoki Nagai and Makoto Shimizu. These partnerships have fostered a creative environment that has led to the development of advanced materials and technologies.

Conclusion

Takuma Ebata's contributions to the field of radiation-sensitive resin technology exemplify his innovative spirit and dedication to advancing material science. His patents and collaborations continue to influence the industry, showcasing the importance of research and development in creating new solutions.

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