Jsr Corporation

Central Glass Company, Limited

Takuma Ebata

Tomoki Nagai

Makoto Shimizu

Tsutomu Shimokawa

Makoto Sugiura

Takanori Kawakami

Satoru Narizuka

Masaki Fujiwara

Hiromitsu Nakashima

Hiroki Nakagawa

Norihiko Ikeda

Eiji Yoneda

Kazuki Kasahara

Jonathan Joachim Jodry

Nobuji Matsumura

Yasuhiko Matsuda

Kaori Sakai

Kenji Hoshiko

Saki Harada

A compound has a partial structure shown by a following formula (1), wherein Rrepresents a hydrogen atom or a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, Rrepresents a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, Rf represents a fluorine atom or a perfluoroalkyl group having 1 to 4 carbon atoms, L represents an integer from 0 to 4, n represents an integer from 0 to 10, and m represents an integer from 1 to 4.

Compound, salt, and radiation-sensitive resin composition

A radiation-sensitive resin composition includes a resin, a radiation-sensitive acid generator, an acid diffusion controller, and a mixed solvent. The radiation-sensitive acid generator includes a compound (I) shown by a following general formula (I). The mixed solvent includes about 50 mass % to about 90 mass % of propylene glycol monomethyl ether acetate, wherein Mrepresents a sulfonium cation or an iodonium cation, R represents a hydrogen atom or a hydrocarbon group having 1 to 8 carbon atoms, Rf represents a fluorine atom or a perfluoroalkyl group having 1 to 4 carbon atoms, n represents an integer from 1 to 10, and m represents an integer from 1 to 4.

Radiation-sensitive resin composition

A radiation-sensitive resin composition which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, exhibiting high resolution performance, excellent DOF and LER, and high resistance to a liquid medium used in liquid immersion lithography is provided. Also provided are a polymer which can be used in the composition, a novel compound useful for synthesizing the polymer, and a method of producing the composition. A radiation-sensitive resin composition having an excellent resistance to a liquid medium can be obtained by using the novel compound shown by the following formula (1), wherein Rrepresents a methyl group or a hydrogen atom, R, Rand Rindividually represent a substituted or unsubstituted monovalent organic group having 1 to 10 carbon atoms, n is an integer from 0 to 3, A represents a methylene group, a linear or branched alkylene group having 2 to 10 carbon atoms, or an arylene group, and Xrepresents a counter ion of S.

Compound, polymer, and resin composition

A radiation-sensitive resin composition includes a resin that includes a repeating unit shown by the following formula (1) and a solvent. The radiation-sensitive resin composition has an excellent performance as a radiation-sensitive acid generator, includes a resin that adversely affects the environment and a human body to only a small extent, and can form a resist film that has a high resolution and forms an excellent resist pattern. wherein Rrepresents a hydrogen atom or the like, Mrepresents a specific cation, and n represents an integer from 1 to 5.

A resin that includes a repeating unit shown by the following formula (10) has an excellent performance as a radiation sensitive acid generator, and exhibits only a small adverse effect on the environment and a human body. wherein Rrepresents a hydrogen atom or the like, Mrepresents a specific cation, and n is an integer from 1 to 5.

Polymerizable sulfonic acid onium salt and resin

A compound is shown by the following formula (5) in which at least one of Rgroups represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A' represents a substituted or unsubstituted, linear or branched alkylene group having 1 to 20 carbon atoms, an alkylene group having at least one hetero atom, or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, Mrepresents an onium cation, m represents a natural number of 1 to 3, and p represents a natural number of 1 to 8. 

Sulfonium compound

A radiation-sensitive resin composition is provided which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, a high resolution radiation-sensitive resin composition providing a wide DOF and excelling in LER. Also provided are a polymer which can be used in the composition and a novel compound useful for synthesizing the polymer. The novel compound is shown by the following formula (2), wherein Rrepresents a methyl group, a trifluoromethyl group, or a hydrogen atom, at least one of the Rs represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A represents a divalent organic group or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, Mrepresents a metal ion or an onium cation, m represents an integer of 1 to 3, and p is an integer of 1 to 8.

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Tokyo, Japan

Takuma Ebata