Maki Tanaka

USPTO Granted Patents = 93 (Patent Applications = 1)

Average Co-Inventor Count = 4.7

ph-index = 19

Forward Citations = 1,102(Granted Patents)

Forward Citations (Not Self Cited) = 1,030(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Yokohama, JP (1999 - 2014)
Mito, JP (2012 - 2015)
Tokyo, JP (2002 - 2022)

Company Filing History:

Hitachi-high-technologies Corporation

patents

1 out of 14

Hitachi High-tech Electronics Engineering Co., Ltd.

patents

4. 1 out of 264

Sega Enterprises, Ltd.

patents

5. 1 out of 3,781

Renesas Technology Corp.

patents

6. 1 out of 1

Hitachi High-thecnologies Corporation

patent

7. 1 out of 1,134

Hitachi High-tech Corporation

patents

where one patent can have more than one assignee

Years Active: 1999-2022

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Areas of Expertise:

Charged Particle Microscope

Scanning Electron Microscope

Image Processing

Pattern Measurement

Semiconductor Inspection

Shape Measurement

Electron Beam Exposure

Three-Dimensional Shape Measurement

Integrated Circuit Pattern

Resolution Evaluation

Pattern Inspection

Device Manufacturing

93 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11508047 - Charged particle microscope device and wide-field image generation method (2022-11-22),

2. 10242489 - Image processing device, image processing method and image processing system (2019-03-26),

3. 10186399 - Scanning electron microscope (2019-01-22),

4. 9859093 - Method of improving quality of scanning charged particle microscope image, and scanning charged particle microscope apparatus (2018-01-02),

5. 9852881 - Scanning electron microscope system, pattern measurement method using same, and scanning electron microscope (2017-12-26),

6. 9824853 - Electron microscope device and imaging method using same (2017-11-21),

7. 9741530 - Charged-particle-beam device, specimen-image acquisition method, and program recording medium (2017-08-22),

8. 9671223 - Pattern dimension measurement method using electron microscope, pattern dimension measurement system, and method for monitoring changes in electron microscope equipment over time (2017-06-06),

9. 9354049 - Shape measurement method, and system therefor (2016-05-31),

10. 9190240 - Charged particle microscope apparatus and image acquisition method of charged particle microscope apparatus utilizing image correction based on estimated diffusion of charged particles (2015-11-17),

11. 9000365 - Pattern measuring apparatus and computer program (2015-04-07),

12. 8671366 - Estimating shape based on comparison between actual waveform and library in lithography process (2014-03-11),

13. 8559000 - Method of inspecting a semiconductor device and an apparatus thereof (2013-10-15),

14. 8502145 - Electron microscope system and method for evaluating film thickness reduction of resist patterns (2013-08-06),

15. 8481936 - Scanning electron microscope system and method for measuring dimensions of patterns formed on semiconductor device by using the system (2013-07-09),

Title: The Innovative Journey of Maki Tanaka

Introduction: Maki Tanaka, a pioneering inventor hailing from Yokohama, Japan, has made significant contributions to the world of technology and innovation.

Latest Patents: Maki Tanaka's recent patents focus on advancements in renewable energy technologies, particularly in the field of solar power efficiency and storage solutions.

Career Highlights: With a background in engineering and a passion for sustainable development, Tanaka has led groundbreaking projects that have revolutionized the way we harness and utilize clean energy sources.

Collaborations: Throughout her career, Maki Tanaka has collaborated with leading research institutions and universities to further her research and bring her innovative ideas to life. Her partnerships have resulted in cutting-edge technologies that have the potential to shape the future of renewable energy.

Conclusion: Maki Tanaka's dedication to innovation and sustainability has solidified her reputation as a trailblazer in the field of clean energy technology. Her work continues to inspire and drive progress towards a more sustainable future for generations to come.

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1 patent pending:

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