The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 31, 2016

Filed:

Oct. 21, 2011
Applicants:

Chie Shishido, Kawasaki, JP;

Maki Tanaka, Tokyo, JP;

Atsushi Miyamoto, Yokohama, JP;

Akira Hamamatsu, Mito, JP;

Manabu Yano, Hitachiomiya, JP;

Inventors:

Chie Shishido, Kawasaki, JP;

Maki Tanaka, Tokyo, JP;

Atsushi Miyamoto, Yokohama, JP;

Akira Hamamatsu, Mito, JP;

Manabu Yano, Hitachiomiya, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 21/04 (2006.01); G01B 15/04 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G01B 21/04 (2013.01); G01B 15/04 (2013.01); H01L 22/12 (2013.01);
Abstract

A model based measurement method is capable of estimating a cross-sectional shape by matching various pre-created cross-sectional shapes with a library of SEM signal waveforms. The present invention provides a function for determining whether or not it is appropriate to create a model of a cross-sectional shape or a function for verifying the accuracy of estimation results to a conventional model based measurement method, wherein a solution space (expected solution space) is obtained by matching library waveforms and is displayed before measuring the real pattern by means of model based measurement. Moreover, after the real pattern is measured by means of model based measurement, the solution space (real solution space) is obtained by matching the real waveforms with the library waveforms and is displayed.


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