The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2015
Filed:
Apr. 07, 2010
Yuzuru Mochizuki, Hitachinaka, JP;
Maki Tanaka, Mito, JP;
Miki Isawa, Hitachinaka, JP;
Satoru Yamaguchi, Hitachinaka, JP;
Yuzuru Mochizuki, Hitachinaka, JP;
Maki Tanaka, Mito, JP;
Miki Isawa, Hitachinaka, JP;
Satoru Yamaguchi, Hitachinaka, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
Provided are a pattern measuring apparatus and a computer program which determine whether a gap formed in a sample () is a core gap () or a spacer gap (). The secondary electron profile of the sample () is acquired, the feature quantities of the secondary electron profile at the positions of edges () are detected, and based on the detected feature quantities, whether each gap adjacent to each of the edges () is the core gap () or the spacer gap () is determined. Furthermore, the waveform profile of the spacer () is previously stored, the secondary electron profile of the sample () is acquired, a matching degree of the secondary electron profile and the stored waveform profile at the position of each spacer () is detected, and based on the detected matching degree, whether the each gap adjacent to each spacer () is the core gap () or the spacer gap () is determined.