Tokyo, Japan

Miki Isawa

This inventor holds 11 USPTO granted patents and 1 published patent application. Top assignees: Hitachi-High-Technologies Corporation, Hitachi High-Tech Corporation. Active years: 2014-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Miki Isawa. Retrieved from https://idiyas.com/inventor/miki-isawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 11 

% Patents Active = 81.8

Average Co-Inventor Count = 4.5

ph-index = 3

Forward Citations = 14(Granted Patents)


Location History:

  • Hitachinaka, JP (2014 - 2015)
  • Tokyo, JP (2016 - 2020)

Company Filing History:


Years Active: 2014-2020

Loading Chart...
11 patents (USPTO):Explore Patents

Title: Innovations by Inventor Miki Isawa

Introduction

Miki Isawa is a highly regarded inventor based in Tokyo, Japan, known for his contributions to the field of semiconductor technology. With a remarkable portfolio of 11 patents to his name, Isawa's work has played a significant role in advancing innovations in pattern evaluation and lithography techniques.

Latest Patents

Among Miki Isawa's latest inventions is the pattern evaluation device. This device is designed with measurement or inspection conditions that facilitate the evaluation of replicas produced by transferring patterns for semiconductor wafers or similar applications. It allows for easy setting of conditions and generation of recipes required for measurement and inspection. The device evaluates patterns on semiconductor wafers using image data or signal waveforms obtained through beam irradiation or probe scanning. It transforms conditions for evaluating the semiconductor wafer to those suitable for evaluating a replica, enhancing the accuracy of assessments.

Another notable patent involves an image processor, method for generating patterns using self-organizing lithographic techniques, and a computer program. This innovation is aimed at effectively addressing samples generated through patterning via Directed Self-Assembly (DSA). The configurations allow for the creation of suitable addressing patterns vital for precise measurements or inspections in the DSA patterning process.

Career Highlights

Isawa's career has been significantly shaped by his time at prestigious companies such as Hitachi High-Tech Corporation and Hitachi High-Technologies Corporation. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Throughout his career, Miki Isawa has collaborated with other notable professionals in the field, including Yuzuru Mizuhara and Hideyuki Kazumi. These partnerships have fostered a dynamic exchange of ideas, promoting advancements in technology and innovation.

Conclusion

Miki Isawa's contributions to the field of semiconductor technology are commendable, demonstrating a commitment to innovation through his patents and collaborations. His work continues to influence the industry, paving the way for future advancements in pattern evaluation and lithography techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…