The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2016
Filed:
Jan. 22, 2014
Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;
Yuzuru Mizuhara, Tokyo, JP;
Miki Isawa, Tokyo, JP;
Minoru Yamazaki, Tokyo, JP;
Hitoshi Tamura, Tokyo, JP;
Hideyuki Kazumi, Tokyo, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
An object of the present invention is to provide a method and an apparatus capable of measuring a potential of a sample surface by using a charged particle beam, or of detecting a compensation value of a variation in an apparatus condition which changes due to sample charging, by measuring a sample potential caused by irradiation with the charged particle beam. In order to achieve the object, a method and an apparatus are provided in which charged particle beams ((),()) emitted from a sample () are deflected by a charged particle deflector () in a state in which the sample () is irradiated with a charged particle beam (), and information regarding a sample potential is detected by using a signal obtained at that time.