This inventor holds 48 USPTO granted patents and 6 published patent applications and 2 EPO patents, primarily in Plasma Processing. Top assignees: Hitachi-High-Technologies Corporation, Hitachi, Ltd., Konica Corporation. Active years: 1988-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Kudamatsu, JP (1999 - 2000)
- Yokohama, JP (1991 - 2004)
- Hitachi, JP (1992 - 2007)
- Hachioji-shi, Tokyo, JP (2007)
- Hikari, JP (2004 - 2012)
- Hachioji, JP (1990 - 2014)
- Tokyo, JP (1988 - 2024)
Company Filing History:
10 out of 2,874 
9 out of 42,731 
8 out of 3,106 
Years Active: 1988-2025
Areas of Expertise:
Title: Hitoshi Tamura - Innovator in Plasma Processing Technology
Introduction
Hitoshi Tamura, an esteemed inventor based in Tokyo, Japan, has made significant contributions to the field of plasma processing technology. With a remarkable portfolio of 47 patents, Tamura has driven innovations that have enhanced the efficiency and effectiveness of plasma processing apparatuses used in various industries.
Latest Patents
Tamura's recent patents focus on advanced plasma processing apparatuses designed to optimize plasma density distribution and improve etching processes. One notable invention describes a plasma processing apparatus that features a vacuum chamber and a microwave power supply unit configured with multiple coaxially arranged waveguides. This innovative setup allows for a high degree of freedom in controlling plasma density distribution, addressing challenges like in-plane uniformity and reducing charge-up damage. Another significant patent introduces a plasma processing apparatus aimed at reducing non-uniformity in plasma distribution. This device incorporates a unique rectangular waveguide system and a cutoff section to achieve different plasma density patterns tailored to specific etching requirements.
Career Highlights
Hitoshi Tamura has built a distinguished career, holding positions in renowned companies such as Hitachi High-Technologies Corporation and Hitachi, Ltd. His work in these organizations has allowed him to pioneer advancements in plasma processing technologies, further establishing his reputation as a leading inventor in this domain.
Collaborations
Throughout his career, Tamura has collaborated with esteemed colleagues, including Seiichi Watanabe and Masahiro Sumiya. These partnerships have contributed to the development of innovative solutions in plasma processing, driving forward the capabilities of this critical technology.
Conclusion
Hitoshi Tamura's contributions to plasma processing technology have positioned him as a key figure in the field of innovation. With 47 patents to his name, his work continues to influence industry standards and practices. As he moves forward, his dedication to improving plasma processing apparatuses demonstrates a commitment to advancing technology and meeting the evolving needs of various sectors.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile