Hitachi-high-technologies Corporation

Hitachi, Ltd.

Konica Corporation

Konica Minolta Business Technologies, Inc.

Kabushiki Kaisha Toshiba

Hitachi High-tech Corporation

Konica Minolta, Inc.

Stanley Electric Co., Ltd

Other

Konishiroku Photo Industry Co., Ltd.

Max Co., Ltd.

Nisca Corporation

Ricoh Printing Systems, Ltd.

Fu Sheng Industrial Co., Ltd

Kanagawa Academy of Science and Technology

Hitoshi Tamura

Seiichi Watanabe

Masahiro Sumiya

Naoki Yasui

Masaaki Uchiyama

Kyoichi Suguro

Gaku Minamihaba

Toshio Shida

Tomonori Aoyama

Tadashi Iijima

Hisataka Hayashi

Hisao Hosoya

Hiroto Ito

Kohji Yoshie

Hirohiko Okabe

Hiromi Niiyama

Hisako Aoyama

Hideyuki Kazumi

Masato Hattori

Tadashi Kuwabara

Katsunori Takahashi

Keiichi Nakane

Toru Otsubo

Tsuyoshi Tsuchiya

Muneo Furuse

Toshitaka Matsumoto

Yuji Kanazawa

Kazuyoshi Omi

Noboru Hatakeyama

Tamotsu Shimizu

Chen Pin Hsu

Naoyuki Urata

Akira Sasaki

Minoru Yamazaki

Kazue Takahashi

Motohiko Yoshigai

Hiroyuki Wakabayashi

Tatsuki Inuzuka

Hiroyuki Koreeda

Takeshi Shibuya

Nobuo Suzuki

Naochika Horio

Akitaka Makino

Kazuhiro Hirota

Teruhiko Toyoizumi

Hiroyuki Tadokoro

Norihiko Ikeda

Minoru Kawano

Harunobu Kusumoto

Norishige Kato

Michiaki Adachi

Tsuyoshi Shiokawa

Tatsushi Ogawa

Hiroto Akiyama

Masahiko Tsuchiya

Takeo Fujiyama

Mikihiro Yamakawa

Yuzuru Mizuhara

Masamichi Sakaguchi

Kouji Kubo

Miki Isawa

Motohiro Tanaka

Kiyoshi Masuda

Atsushi Onose

Takashi Kamimura

Ichiro Sasaki

Hideki Kuwamoto

Masaki Fujiwara

Shigeki Taniguchi

Kazushi Hayakawa

Eiji Yoshino

Masaki Kawase

Akihiro Sano

Tsuyoshi Maruyama

Nanako Tamari

Toshimichi Arai

Hideyo Ohashi

Hirotaka Kataoka

Makoto Tamura

Takao Tsukada

Nobutaka Kato

Toshiyuki Yamada

Norimitsu Sekiguchi

Tomoki Nagaoka

Kazuaki Fukuda

Masayuki Kanda

Tadashi Okada

Yoshihiko Kondo

Yasuo Okuno

Junichi Seki

Tomokazu Nagata

Masaki Fujii

Toshio Kushida

Kozo Mineki

Hiroto Itou

Tatsunari Satoo

Kuninori Suzuki

Shigeyuki Taguchi

Takeshi Kasai

Atsushu Iijima

A plasma processing apparatus including a processing chamber including therein a sample stage on which a substrate to be processed is placed; a magnetic field generating unit configured to generate a magnetic field inside the processing chamber; a microwave power source configured to generate microwave power; microwave power transfer units configured to transfer the microwave power; and a microwave three-dimensional circuit unit configured to supply the transferred microwave power into a processing chamber via a dielectric window. The microwave three-dimensional circuit unit includes a branch circuit configured to branch the microwave power transferred by the microwave power transfer unit in a plurality of azimuth directions, a ring resonator configured to resonate the microwave power branched in the plurality of azimuth directions by the branch circuit, and a coaxial line configured to supply the microwave power resonated by the ring resonator into the processing chamber via the dielectric window.

Plasma processing apparatus

In order to enable plasma density distribution control having a high degree of freedom to solve problems of not only in-plane uniformity of an etching processing but also a reduction of a charge-up damage, a plasma processing apparatus includes: a vacuum chamber provided with a plasma processing chamber that plasma-processes a substrate inside and is able to exhaust the inside of this plasma processing chamber to a vacuum; and a microwave power supply unit that is provided with a microwave source and a circular waveguide and supplies, via the circular waveguide, a microwave power oscillated from the microwave source to the vacuum chamber, in which the microwave power supply unit is configured by arranging a plurality of waveguides, which are coaxially and concentrically arranged with the circular waveguide and have different dielectric constants inside, between the circular waveguide and the vacuum chamber.

A plasma processing apparatus adapted to reduce non-uniformity of plasma distribution in a process chamber and to adjust the plasma distribution to 'centrally high density', “circumferentially high density”, or “uniform density” in accordance with a desired etching process, a process chamber; a radio frequency power source; a rectangular waveguide; and a circular waveguide connected to the rectangular waveguide, in which the rectangular waveguide includes an upper rectangular waveguide and a lower rectangular waveguide formed by vertically dividing the rectangular waveguide; and a cutoff section which cuts off the microwave frequency power and which has a dielectric body. The circular waveguide includes an inner waveguide connected to the upper rectangular waveguide and formed inside; and an outer waveguide connected to the lower rectangular waveguide and formed on an outer side of the inner waveguide. The cutoff section has a width narrower than those of the rectangular waveguides except the cutoff section.

In order to provide a plasma processing apparatus or method with improved processing uniformity, a plasma processing apparatus includes: a processing chamber which is disposed inside a vacuum container; a sample stage which is disposed inside the processing chamber and has a top surface for placing a wafer corresponding to a processing target thereon; an electric field forming part which forms an electric field supplied into the processing chamber; a coil which forms a magnetic field for forming plasma inside the processing chamber by an interaction with the electric field; and a controller which increases or decreases intensity of the plasma inside the processing chamber by repeatedly increasing or decreasing intensity of the magnetic field formed by the coil at a predetermined interval, wherein the wafer is processed while the plasma is repeatedly formed and diffused.

Plasma processing apparatus and plasma processing method

An image forming apparatus includes: a first conveyance roller pair configured to convey a sheet by rotating while tightly sandwiching the sheet; a rotation blade pair disposed on a downstream side of the first conveyance roller pair in a conveyance path of the sheet and configured to cut the sheet in a direction parallel to the conveyance direction by rotating while sandwiching the sheet; and a second conveyance roller pair configured to convey a cut waste sheet cut by the rotation blade pair in the sheet conveyance direction by rotating while tightly sandwiching the cut waste sheet. A rotational speed of the second conveyance roller pair is controlled at a rotational speed higher than a rotational speed of the first conveyance roller pair.

Image forming apparatus and image formation system

Provided is a plasma processing apparatus including: a circular waveguide connected with a vacuum vessel, and through which a circularly polarized wave of an electric field for plasma formation propagates; a processing chamber which is arranged below the circular waveguide, and in which plasma is formed; a circularly polarized wave generator, which is arranged in the waveguide; a circularly polarized wave adjuster which is connected with the circular waveguide below the circularly polarized wave generator; a circularly polarized wave detector which is below the circularly polarized wave adjuster; and a controller which adjusts an operation of the circularly polarized wave adjuster according to an output from the circularly polarized wave detector, in which the circularly polarized wave adjuster adjusts a length of a protrusion of a dielectric stub into the circular waveguide based on a signal from the controller.

An object of the present invention is to provide a method and an apparatus capable of measuring a potential of a sample surface by using a charged particle beam, or of detecting a compensation value of a variation in an apparatus condition which changes due to sample charging, by measuring a sample potential caused by irradiation with the charged particle beam. In order to achieve the object, a method and an apparatus are provided in which charged particle beams ((),()) emitted from a sample () are deflected by a charged particle deflector () in a state in which the sample () is irradiated with a charged particle beam (), and information regarding a sample potential is detected by using a signal obtained at that time.

Charged particle beam apparatus

A roller mechanism includes a roller and a support member that supports the rotation shaft. Herein, the support member includes a bearing having an outer ring and inner ring which rotate relatively to each other, and a sleeve that is fittingly fixed to the inner ring, wherein the sleeve and rotation shaft are fitted to each other by clearance fitting and further engaged with each other with respect to a rotation direction.

Roller mechanism with support member and image forming apparatus having the roller

A pneumatic tool includes a tool body, a nose part for ejecting a nail, which is provided in a lower part of the tool body, an air chamber for storing compressed air, which is provided in the tool body, an air supply pipe for supplying the compressed air from an air supply source to the air chamber, an air duster, an air duster pipeline connected to an air outlet of the air duster, and an air duster valve for controlling supply of the compressed air to the air duster pipeline.

Pneumatic tool

A plasma processing apparatus for generating highly-uniform and stable plasma. In an apparatus for generating plasma by using a &#x3bc; wave, concerning a method for rotating the &#x3bc; wave in terms of time, a plurality of (larger than two and smaller than four) waveguides are used, then forming an angle between the respective waveguides, and setting a phase difference between respective electric fields therein. This configuration allows introduction of the circularly polarized wave into a processing chamber. At this time, there are provided configuration components such as a waveguide locating method, a unit therefor, a &#x3bc;-wave merging box, and a reflective-wave control unit using a reflection control chamber.

A weight piece () containing 15 wt. % or greater of iron and tungsten, and having a specific gravity of 9 or larger, larger than a material of a head body () made of steel or pure iron, is joined to the head body () by welding.

Golf club head

The invention provides a plasma processing apparatus and a plasma processing method capable of controlling the voltage of the processing substrate with high accuracy, thereby enabling a highly accurate plasma processing. According to the invention, a voltage of the processing substrate is measured using a processing substrate with a voltage probe prepared in advance, and based on a bias voltage supplied to an electrostatic chuck mechanism and a bias current flowing through the electrostatic chuck mechanism, a capacity component which is an impedance representing the electric property of the electrostatic chuck mechanism is computed numerically. Then, based on a predetermined expression, the voltage of the processing substrate is estimated using the bias voltage of the processing substrate to be measured, the bias current flowing through the electrostatic chuck mechanism and the capacity component which is the impedance acquired in advance.

In a sheet aligning apparatus, a pair of sheet aligning members stops at three positions such that when a sheet aligning operation is not conducted, the pair of sheet aligning members is stopped at the first position of an upper level so as not to come in contact with sheets discharged from a discharging section, when the sorting section shifts for sorting, the pair of sheet aligning members is stopped at the second position of a middle level lower than the first position so as not to come in contact with sheets stacked on the tray, and when a sheet aligning operation is conducted, the pair of sheet aligning members is stopped at the third position of a lower level so as to come in contact with the top surface of the tray or the upper surface of the sheets stacked on the tray.

Sheet aligning apparatus

A plasma processing apparatus having a processing chamber and a sample base, and processing a sample by using plasma generated inside the processing chamber, the processing chamber being located inside a vacuum container, the sample base being located inside the processing chamber, the sample being mounted on the sample base, the plasma processing apparatus including a component member configuring inner-side wall surface of the processing chamber, and having a dielectric portion on the inner-side wall surface, an exhaustion unit for exhausting the inside of the processing chamber, and an electric-field supply unit for supplying an electric field to the component member in a state where the plasma will not be generated inside the processing chamber, wherein magnitude of the electric field supplied from the electric-field supply unit is changed rapidly while exhausting the inside of the processing chamber by the exhaustion unit.

The invention is to provide a sheet accumulation apparatus enabling to uniformly load tabbed sheets into a train of sheets for load and store the sheets on a tray. The sheet accumulation apparatus has a sheet outlet for successively discharging the sheets, a tray means for loading to hold the sheets thereon, a sheet carrier means for discharging the sheets from the sheet outlet to the side of a downstream, a sheet front end regulating means for colliding the sheets sent by the sheet carrier means against the regulating means at the sheet front ends and regulating them, and a sheet rear regulating means disposed to the tray means for regulating the positions of the sheets from the sheet outlet at the sheet rear ends. The sheet front end regulating means comprises (1) stopper member movable back and forth in the sheet carrying direction; or (2) stopper means of two or more disposed back and forth in the sheet carrying direction and selectively facing the sheet front end regulating means; or (3) stopper means movable in a direction traversing with carrying along the sheet head ends; a shift means for driving the stopper means; and a control means for controlling the shift means.

Sheet accumulation apparatus and image forming system having same

Growing community of inventors

Tokyo, Japan

Hitoshi Tamura