The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2016
Filed:
Feb. 18, 2013
Hitachi High-technologies Corporation, Tokyo, JP;
Toshiyuki Yokosuka, Tokyo, JP;
Chahn Lee, Tokyo, JP;
Hideyuki Kazumi, Tokyo, JP;
Hiroshi Makino, Tokyo, JP;
Yuzuru Mizuhara, Tokyo, JP;
Miki Isawa, Tokyo, JP;
Michio Hatano, Tokyo, JP;
Yoshinori Momonoi, Tokyo, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
An object of the invention is to provide a scanning electron microscope which forms an electric field to lift up, highly efficiently, electrons discharged from a hole bottom or the like even if a sample surface is an electrically conductive material. To achieve the above object, according to the invention, a scanning electron microscope including a deflector which deflects a scanning position of an electron beam, and a sample stage for loading a sample thereon, is proposed. The scanning electron microscope includes a control device which controls the deflector or the sample stage in such a way that before scanning a beam on a measurement target pattern, a lower layer pattern situated in a lower layer of the measurement target pattern undergoes beam irradiation on another pattern situated in the lower layer.