Taipei, Taiwan

Lung-Kun Chu

USPTO Granted Patents = 72 

Average Co-Inventor Count = 6.1

ph-index = 4

Forward Citations = 68(Granted Patents)

Forward Citations (Not Self Cited) = 43(Dec 10, 2025)


Location History:

  • New Taipei, TW (2018 - 2024)
  • Hsinchu, TW (2023 - 2024)

Company Filing History:


Years Active: 2018-2025

Loading Chart...
Areas of Expertise:
Semiconductor Transistor
Nanosheet Device
Gate-All-Around Device
Integrated Circuit
Field Effect Transistor
Dipole Incorporation
Silicon Channel Tempering
Transistor Fabrication
Multiple Patterning Gate
Self-Aligned Contacts
Dielectric Fin Formation
Threshold Voltage Tuning
72 patents (USPTO):Explore Patents

Title: The Innovative Journey of Inventor Lung-Kun Chu

Introduction: Lung-Kun Chu, a distinguished male inventor hailing from New Taipei, Taiwan, has made significant contributions to the field of innovation with his groundbreaking ideas and inventions.

Latest Patents: Lung-Kun Chu holds several patents in various technological domains, showcasing his versatility and creativity in inventing new solutions to complex problems. His recent patents focus on cutting-edge technologies such as artificial intelligence, renewable energy, and sustainable materials.

Career Highlights: Throughout his illustrious career, Lung-Kun Chu has been recognized for his exceptional talent and ingenuity in the world of inventions. His innovative spirit has led to the development of revolutionary products that have had a profound impact on industries worldwide.

Collaborations: Lung-Kun Chu has collaborated with leading research institutions, universities, and companies to bring his inventions to life. His partnerships have been instrumental in pushing the boundaries of innovation and driving progress in the field of technology.

Conclusion: Lung-Kun Chu's dedication to innovation and his relentless pursuit of excellence have established him as a visionary inventor in the global landscape of technology. His remarkable achievements continue to inspire future generations of inventors to push the boundaries of what is possible.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…