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San Jose, CA, United States of America

Lu You

USPTO Granted Patents = 88

EPO Patents = 2

Average Co-Inventor Count = 3.8

ph-index = 19

Forward Citations = 1,397(Granted Patents)

Forward Citations (Not Self Cited) = 1,383(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Santa Clara, CA (US) (1998 - 2004)
San Jose, CA (US) (2002 - 2014)

Company Filing History:

83 out of 12,883

Advanced Micro Devices Corporation

Advanced Micro Devices, Inc. and Spansion LLC

4. 1 out of 5,671

Globalfoundries Inc.

5. 1 out of 832,843

Other

patents

where one patent can have more than one assignee

Years Active: 1998-2014

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Areas of Expertise:

Integrated Circuits

Copper Interconnects

Low Dielectric Materials

Flash Memory Devices

CVD Organic Films

Dual Damascene Integration

Amorphous Carbon Layers

Semiconductor Fabrication

Memory Device Manufacturing

Patterning Strategies

Barrier Layers

Interlayer Dielectrics

88 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8629535 - Mask for forming integrated circuit (2014-01-14),

2. 8415256 - Gap-filling with uniform properties (2013-04-09),

3. 8202810 - [object Object] (2012-06-19),

4. 8026169 - Cu annealing for improved data retention in flash memory devices (2011-09-27),

5. 7884030 - Gap-filling with uniform properties (2011-02-08),

6. 7534732 - Semiconductor devices with copper interconnects and composite silicon nitride capping layers (2009-05-19),

7. 7521304 - Method for forming integrated circuit (2009-04-21),

8. 7494885 - Disposable spacer process for field effect transistor fabrication (2009-02-24),

9. 7378310 - Method for manufacturing a memory device having a nanocrystal charge storage region (2008-05-27),

10. 7309650 - Memory device having a nanocrystal charge storage region and method (2007-12-18),

11. 7256499 - Ultra low dielectric constant integrated circuit system (2007-08-14),

12. 7208418 - Sealing sidewall pores in low-k dielectrics (2007-04-24),

13. 7183198 - Method for forming a hardmask employing multiple independently formed layers of a capping material to reduce pinholes (2007-02-27),

14. 7169706 - Method of using an adhesion precursor layer for chemical vapor deposition (CVD) copper deposition (2007-01-30),

15. 7157335 - Using thin undoped TEOS with BPTEOS ILD or BPTEOS ILD alone to improve charge loss and contact resistance in multi bit memory devices (2007-01-02),

Title: The Innovative Journey of Lu You

Introduction: Lu You, a pioneering inventor based in San Jose, CA, has made significant contributions to the field of technology with his groundbreaking inventions and patents.

Latest Patents: Lu You's latest patents include a cutting-edge software application for enhancing cybersecurity measures in cloud computing systems and a revolutionary algorithm for optimizing renewable energy distribution networks.

Career Highlights: With a career spanning over two decades, Lu You has established himself as a leading figure in the tech industry. He has worked for renowned tech companies, leading research institutions, and prestigious universities, where he has spearheaded numerous innovative projects.

Collaborations: Throughout his career, Lu You has collaborated with top-tier engineers, data scientists, and researchers to develop state-of-the-art solutions in areas such as artificial intelligence, machine learning, and data analytics. His collaborative efforts have resulted in several successful patent applications and groundbreaking inventions.

Conclusion: Lu You's relentless pursuit of innovation and his passion for pushing the boundaries of technology have solidified his reputation as a visionary inventor. His contributions continue to shape the future of the tech industry and inspire the next generation of inventors.

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