Dali, Taiwan

Ku-Feng Yang

USPTO Granted Patents = 83 

Average Co-Inventor Count = 4.6

ph-index = 9

Forward Citations = 1,461(Granted Patents)

Forward Citations (Not Self Cited) = 1,436(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Taichung, TW (2011)
  • Dali, TW (2010 - 2017)
  • Hsinchu County, TW (2017 - 2023)
  • Baoshan Township, TW (2015 - 2024)

Company Filing History:


Years Active: 2010-2025

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Areas of Expertise:
Semiconductor Devices
Through-Substrate Vias
Interconnect Structures
TSV Formation
3D Integrated Circuits
Plating Apparatus
Wafer Pre-Wetting
Dummy Structures
Isolation Bonding Films
Backside Interconnects
Heterogeneous Dielectric Bonding
Redistribution Layers
83 patents (USPTO):Explore Patents

Title: The Innovative Journey of Inventor Ku-Feng Yang

Introduction: Ku-Feng Yang, a talented inventor hailing from Dali, Taiwan, has made significant contributions to the field of technology with his groundbreaking innovations.

Latest Patents: Ku-Feng Yang holds several patents in the areas of electronics and renewable energy, showcasing his continuous commitment to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Ku-Feng Yang has worked tirelessly to develop cutting-edge solutions that have revolutionized the industry. His keen eye for detail and passion for innovation have led to the creation of several groundbreaking technologies.

Collaborations: Throughout his career, Ku-Feng Yang has collaborated with leading research institutions and tech companies to further his inventions. His ability to work in multidisciplinary teams has resulted in the successful development of innovative products that have had a lasting impact on the industry.

Conclusion: Ku-Feng Yang's dedication to innovation and his relentless pursuit of excellence have solidified his position as a pioneering inventor in the world of technology. His contributions continue to inspire future generations of inventors to push the boundaries of what is possible in the realm of technological innovation.

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