The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2025
Filed:
Jan. 26, 2023
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Kuan-Kan Hu, Hsinchu, TW;
Tsung-Kai Chiu, Hsinchu County, TW;
Wei-Yen Woon, Taoyuan, TW;
Szuya Liao, Zubei Hsinchu, TW;
Ku-Feng Yang, Hsinchu County, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu, TW;
Abstract
A method is provided that includes depositing a catalyst layer along a surface of the opening and performing a selectivity enhancement process. The selectivity enhancement process alters a deposition rate of a metal component on at least one region of the catalyst layer. The metal component is deposited on the catalyst layer. Exemplary selectivity enhancement processes include a self-assembled monolayer (SAM), introducing an accelerator, and/or introducing a suppressor.