Wei-Yen Woon

Title: Innovations by Inventor Wei-Yen Woon

Introduction

Wei-Yen Woon, based in Taoyuan, Taiwan, is a notable inventor with an impressive portfolio of 15 patents. His work primarily focuses on semiconductor devices and manufacturing methods, greatly contributing to advancements in electronics and materials science.

Latest Patents

Among his latest innovations, Woon has developed a patent for a semiconductor device and manufacturing method thereof. This invention outlines a detailed procedure for manufacturing semiconductor devices, including the formation of a first transistor over a substrate, integrating features like interlayer dielectric layers and semimetal layers, and forming source/drain contacts.

Another significant patent by Woon includes a semiconductor device characterized by a low-k isolation structure made from dielectric material, specifically boron nitride. This creation enhances device performance by reducing capacitance, thereby optimizing electron mobility within microelectronic devices.

Career Highlights

Wei-Yen Woon has made substantial contributions to the field of semiconductor technology during his career. He has worked with major organizations such as Taiwan Semiconductor Manufacturing Company Limited and Tsinghua University, which are known for their cutting-edge research and development in semiconductor design and production.

Collaborations

Throughout his career, Woon has collaborated with esteemed colleagues including Mrunal Abhijith Khaderbad and Cheng-Ming Lin. These collaborations have likely enriched his innovative approach and spurred new developments in his field.

Conclusion

Wei-Yen Woon’s contributions to semiconductor technology through his patents reflect his dedication and ingenuity as an inventor. His work continues to have a lasting impact on the industry, helping to pave the way for future innovations in electronics.