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For the Inventor, By the Inventor

Tochigi, Japan

Koichi Sentoku

This inventor holds 53 USPTO granted patents and 12 published patent applications and 4 EPO patents, primarily in Lithography Technology (CPC class 3563). Top assignee: Canon Kabushiki Kaisha. Active years: 1994-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Koichi Sentoku. Retrieved from https://idiyas.com/inventor/koichi-sentoku

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 53 

% Patents Active = 56.6

 

Average Co-Inventor Count = 3.0

ph-index = 15

Forward Citations = 609(Granted Patents)

Forward Citations (Not Self Cited) = 492(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Kanagawa, JP (1995)
  • Samukawamachi, JP (1996 - 1997)
  • Atsugi, JP (1994 - 1998)
  • Kanagawa-ken, JP (1996 - 1998)
  • Utsunomiya, JP (1997 - 2003)
  • Tochigi, JP (2003 - 2008)
  • Tochigi-ken, JP (2010 - 2014)
  • Kawachi-gun, JP (2008 - 2019)

Company Filing History:

goldMedal53 out of 92,994 
 
Canon Kabushiki Kaisha
 patents

Years Active: 1994-2019

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Areas of Expertise:
Calibration Method
Measurement Apparatus
Exposure Apparatus
Lithography Apparatus
Alignment Method
Device Manufacturing
Surface Shape Measurement
Position Detection
Pattern Transfer
Imprint Method
Management System
Control Method
53 patents (USPTO):Explore Patents
1. 10401744 - Calibration method, measurement apparatus, exposure apparatus, and method of manufacturing article (2019-09-03),
2. 9257262 - Lithography apparatus, lithography method, and method of manufacturing article (2016-02-09),
3. 8922774 - Method of manufacturing device, and substrate (2014-12-30),
4. 8845317 - Alignment method, imprint method, alignment apparatus, and position measurement method (2014-09-30),
5. 8618515 - Lithography apparatus and device manufacturing method (2013-12-31),
6. 8338805 - Reticle manufacturing method, surface shape measuring apparatus and signal processor (2012-12-25),
7. 8089612 - Position detection apparatus, position detection method, exposure apparatus, and device fabrication method (2012-01-03),
8. 7952725 - Surface shape measurement apparatus and exposure apparatus (2011-05-31),
9. 7884935 - Pattern transfer apparatus, imprint apparatus, and pattern transfer method (2011-02-08),
10. 7771905 - Method and program for calculating exposure dose and focus position in exposure apparatus, and device manufacturing method (2010-08-10),
11. 7670729 - Measurement method and apparatus, exposure apparatus, and device fabrication method (2010-03-02),
12. 7586582 - Exposure apparatus (2009-09-08),
13. 7531821 - Imprint apparatus and imprint method including dual movable image pick-up device (2009-05-12),
14. 7435984 - Imaging optical system and exposure apparatus (2008-10-14),
15. 7396620 - Exposure method and exposure management system (2008-07-08),

Title: Koichi Sentoku: Pioneering Inventor from Tochigi, Japan

Introduction: Koichi Sentoku is a renowned inventor hailing from Tochigi, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Koichi Sentoku holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his continuous dedication to pushing the boundaries of scientific advancement.

Career Highlights: With a career spanning over two decades, Koichi Sentoku has worked with leading research institutions and universities, playing a pivotal role in developing cutting-edge solutions for complex technological challenges.

Collaborations: Throughout his career, Koichi Sentoku has collaborated with top companies, innovative startups, and brilliant minds in the industry, fostering a culture of creativity and collaboration to drive forward progress in the world of inventions.

Conclusion: Koichi Sentoku's passion for innovation, coupled with his relentless pursuit of excellence, has solidified his position as a trailblazer in the realm of inventions, inspiring future generations to dream big and think outside the box.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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