The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 08, 2011

Filed:

Apr. 18, 2007
Applicants:

Nobuhito Suehira, Kawasaki, JP;

Junichi Seki, Yokohama, JP;

Hideki Ina, Tokyo, JP;

Koichi Sentoku, Tochigi-ken, JP;

Inventors:

Nobuhito Suehira, Kawasaki, JP;

Junichi Seki, Yokohama, JP;

Hideki Ina, Tokyo, JP;

Koichi Sentoku, Tochigi-ken, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/00 (2006.01); G01B 15/00 (2006.01); G01N 21/86 (2006.01); G01V 8/00 (2006.01); B41F 1/34 (2006.01); B41F 21/12 (2006.01); B41F 21/14 (2006.01); B41L 1/02 (2006.01); B29C 45/76 (2006.01); B29C 35/08 (2006.01); B29C 35/12 (2006.01); B29C 47/92 (2006.01); B29C 47/96 (2006.01); B29B 13/00 (2006.01); B29B 15/00 (2006.01); B28B 17/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A pattern transfer apparatus transfers an imprint pattern formed on a mold, provided with an alignment mark, to a resin material on a substrate, provided with an alignment mark. A first image pickup device obtains an image of an object positioned at a first object position. A second image pickup device obtains an image of an object positioned at a second object position. The second object position is more distant from the alignment mark of the mold than the first object position. An optical system forms an image of an object positioned at the first object position and an image of an object positioned at the second object position. Alignment is performed based on first and second information obtained about positions of images of an alignment mark of a reference substrate and an alignment mark of the substrate, to transfer the imprinting pattern to the resin material.


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