The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2008
Filed:
Aug. 27, 2004
Koichi Sentoku, Tochigi, JP;
Koichi Sentoku, Tochigi, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
There is provided an exposure method for exposing a pattern on an original form onto an object through a projection optical system. The exposure method includes the steps of obtaining, for each piece of information of resist applied to a first object, a correlation among an exposure dose for exposing the first object, a focus state of the first object in the projection optical system, and a pattern shape formed on the first object exposed with the exposure dose and the focus state, acquiring information of resist applied to a second object different from the first object, determining an exposure dose for exposing the second object, and a focus state of the second object in the projection optical system, based on the correlation obtained by the obtaining step and the information of the resist applied to the second object acquired by the acquiring step, and transferring the pattern formed on the original form onto the second object in accordance with the exposure dose and focus state determined by the determining step.