The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 2010
Filed:
Jun. 01, 2005
Atsushi Takagi, Tochigi-ken, JP;
Hideki Ina, Kanagawa-ken, JP;
Koichi Sentoku, Tochigi-ken, JP;
Hiroshi Morohoshi, Tochigi-ken, JP;
Atsushi Takagi, Tochigi-ken, JP;
Hideki Ina, Kanagawa-ken, JP;
Koichi Sentoku, Tochigi-ken, JP;
Hiroshi Morohoshi, Tochigi-ken, JP;
Canon Kabushiki Kaisha, , JP;
Abstract
A measurement method for measuring a distortion of a projection optical system that projects a pattern, used by an exposure apparatus that exposes the reticle pattern onto an object to be exposed, the measurement method includes the steps of a first exposing step for exposing a mark pattern onto the object to be exposed, the mark pattern having a mark on or near an optical axis of the projection optical system and a mark beside the optical axis, and being arranged at a position of the reticle, a second exposing step for only exposing a mark on or near the optical axis of the projection optical system in the mark pattern, measuring step for measuring a shape of the mark formed on the object to be exposed via the first and second exposing steps, and calculating step for calculating the distortion of the projection optical system from the shape of the mark measured by the measuring step.