The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2010
Filed:
Dec. 29, 2006
Koichi Sentoku, Kawachi-gun, JP;
Hideki Ina, Toshima-ku, JP;
Koji Mikami, Nikko, JP;
Yoshiaki Sugimura, Utsunomiya, JP;
Hiroto Yoshii, Utsunomiya, JP;
Tomoyuki Miyashita, Utsunomiya, JP;
Koichi Sentoku, Kawachi-gun, JP;
Hideki Ina, Toshima-ku, JP;
Koji Mikami, Nikko, JP;
Yoshiaki Sugimura, Utsunomiya, JP;
Hiroto Yoshii, Utsunomiya, JP;
Tomoyuki Miyashita, Utsunomiya, JP;
Canon Kabushiki Kaisha, , JP;
Abstract
A method for calculating an offset of an exposure dose and a focus position in an exposure apparatus that exposes a substrate via an original includes the steps of obtaining information of a shape of a pattern formed on the substrate using the exposure apparatus, calculating a shift amount between a critical dimension contained in the information of the shape of the pattern and a reference value of the critical dimension, and calculating an offset of the focus position based on the information of the shape of the pattern, and calculating the offset of the exposure dose based on the shift amount and the offset of the focus position.