This inventor holds 22 USPTO granted patents and 3 published patent applications and 11 EPO patents, primarily in Chemical Mechanical Polishing. Top assignees: Cabot Microelectronics Corporation, Eastman-Kodak Company, Cmc Materials, Inc.. Active years: 2000-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Rochester, NY (US) (2000 - 2013)
- Aurora, IL (US) (2014 - 2023)
Company Filing History:
9 out of 297 
8 out of 21,604 
5 out of 35 
Years Active: 2000-2025
Areas of Expertise:
Title: Kevin P Dockery: Innovations in Chemical Mechanical Polishing
Introduction
Kevin P Dockery, based in Aurora, IL, is a notable inventor with a remarkable portfolio of 20 patents. His contributions to the field of chemical mechanical polishing (CMP) highlight his expertise and innovative spirit. Dockery has consistently developed solutions that enhance the effectiveness of CMP compositions, making significant strides in the manufacturing processes for various substrates.
Latest Patents
Among his latest patents, Dockery has focused on developing a CMP composition that includes a novel abrasive. This composition features a liquid carrier and colloidal silica particles, which are characterized by a positive charge of at least 10 mV. The colloidal silica particles, with a number average aspect ratio of greater than 1.25 and a normalized particle size span by weight exceeding 0.42, provide unique polishing capabilities. Additionally, he has invented a CMP composition that incorporates derivatized polyamino acids. This composition consists of a water-based liquid carrier, abrasive particles, and a cationic polymer containing derivatized amino acid monomer units, enhancing the polishing process of metal and dielectric layers from substrates.
Career Highlights
Throughout his career, Kevin Dockery has worked with leading companies, including Cabot Microelectronics Corporation and Eastman Kodak Company. His work in these organizations has allowed him to drive innovation in CMP technologies, contributing to advancements in materials used in the semiconductor industry.
Collaborations
Dockery has collaborated with notable professionals in his field, including Helin Huang and Renhe Jia. Their joint efforts in research and development have led to significant improvements in polishing compositions, underscoring the importance of teamwork in the pursuit of technological advancements.
Conclusion
Kevin P Dockery's contributions to the field of chemical mechanical polishing are significant, with a solid body of patents that reflect his inventive spirit. His innovative compositions not only improve existing methodologies but also pave the way for future advancements in substrate polishing technologies. With a strong career behind him and valuable collaborations, Dockery continues to influence the landscape of innovation in his field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile