The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2025
Filed:
Aug. 25, 2022
Applicant:
Cmc Materials, Inc., Aurora, IL (US);
Inventors:
Yang-Yao Lee, Tainan, TW;
Hsin-Yen Wu, Kaohsiung, TW;
Kevin P. Dockery, Aurora, IL (US);
Na Zhang, Naperville, IL (US);
Chi-Rung Shie, Kaohsiung, TW;
Assignee:
CMC Materials LLC, Aurora, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); C09K 3/14 (2006.01); H01L 21/321 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); C09K 3/1454 (2013.01); H01L 21/3212 (2013.01);
Abstract
A chemical mechanical polishing composition comprises, consists of, or consists essentially of a liquid carrier, anionic particles dispersed in the liquid carrier, an anionic polymer or surfactant, and a cationic polymer.