Na Zhang

Title: Inventor Spotlight: Na Zhang from Naperville, IL

Introduction

Na Zhang is a notable inventor based in Naperville, Illinois, with a focus on developing innovative solutions in the field of chemical mechanical polishing. With two patents to her name, she has made significant contributions that enhance the efficiency and effectiveness of substrate polishing processes.

Latest Patents

Na Zhang's recent patents include groundbreaking compositions that are essential for chemical mechanical polishing. Her first patent, titled "Derivatized Polyamino Acids," describes a composition comprising a polymer which includes a derivatized amino acid monomer unit. This innovative chemical mechanical polishing composition utilizes a water-based liquid carrier, with abrasive particles dispersed within it, complemented by a cationic polymer containing the derivatized amino acid monomer unit. This technology facilitates the effective removal of metal or dielectric layers from substrates.

The second patent, known as "Composition for Tungsten CMP," outlines a chemical mechanical polishing composition featuring a water-based liquid carrier and cationic abrasive particles. It includes two amino acid compounds characterized by different isoelectric points, playing a critical role in the polishing process. The pH of this composition is finely tuned to a range of about 1 to 5, enhancing its effectiveness when used to polish substrates with tungsten layers.

Career Highlights

Throughout her career, Na Zhang has been associated with esteemed organizations such as Cabot Microelectronics Corporation and CMC Materials, Inc. Her work at these companies reflects her commitment to advancing materials science and chemical engineering for substrate processing applications.

Collaborations

Na has collaborated with talented professionals, including her coworkers Kevin P Dockery and Roman A Ivanov. These collaborations have provided her with a robust network of support and expertise, further strengthening her innovative contributions to the field.

Conclusion

Na Zhang's innovative work and patent contributions significantly impact the landscape of chemical mechanical polishing technologies. Her expertise and collaborative efforts with other professionals continue to drive advancements in the industry, affirming her position as a leading inventor in her field.