The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2015
Filed:
May. 29, 2014
Cabot Microelectronics Corporation, Aurora, IL (US);
Tina Li, Warrenville, IL (US);
Kevin Dockery, Aurora, IL (US);
Renhe Jia, Naperville, IL (US);
Jeffrey Dysard, St. Charles, IL (US);
Cabot Microelectronics Corporation, Aurora, IL (US);
Abstract
The invention provides a chemical-mechanical polishing composition containing a ceria abrasive and a polymer of formula I: wherein Xand X, Yand Y, Zand Z, R, R, R, and R, and m are as defined herein, and water, wherein the polishing composition has a pH of about 1 to about 4.5. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains silicon oxide, silicon nitride, and/or polysilicon.