Tina C Li

Title: Innovations of Inventor Tina C Li

Introduction

Tina C Li is a prominent inventor based in Warrenville, IL (US). She has made significant contributions to the field of chemical-mechanical polishing, holding a total of 9 patents. Her work has been instrumental in advancing technologies related to substrate polishing.

Latest Patents

One of her latest patents is titled "Self-stopping polishing composition and method for bulk oxide planarization." This invention provides a chemical-mechanical polishing composition that includes an abrasive, a self-stopping agent, an aqueous carrier, and a cationic polymer. Additionally, it offers a method suitable for polishing a dielectric substrate. Another patent with a similar title also focuses on a self-stopping polishing composition and method for bulk oxide planarization, emphasizing the importance of these innovations in the polishing process.

Career Highlights

Throughout her career, Tina has worked with notable companies such as Cabot Microelectronics Corporation and CMC Materials, Inc. Her experience in these organizations has allowed her to refine her expertise in the field of polishing technologies.

Collaborations

Tina has collaborated with several professionals in her field, including Alexander W Hains and Viet Lam. These collaborations have contributed to her innovative work and the development of her patents.

Conclusion

Tina C Li is a remarkable inventor whose contributions to chemical-mechanical polishing have made a significant impact in the industry. Her patents reflect her dedication to innovation and her ability to solve complex problems in substrate polishing.