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For the Inventor, By the Inventor

Wako, Japan

Ken Harada

USPTO Granted Patents = 29 

 

Average Co-Inventor Count = 3.3

ph-index = 5

Forward Citations = 62(Granted Patents)


Location History:

  • Fuchu, JP (2005 - 2015)
  • Fukuoka, JP (2016 - 2018)
  • Wako, JP (2009 - 2021)
  • Tokyo, JP (2014 - 2023)
  • Saitama, JP (2023)

Company Filing History:

goldMedal13 out of 851 
 
Riken Corporation
 patents
silverMedal12 out of 42,485 
 
Hitachi, Ltd.
 patents
bronzeMedal5 out of 2,346 
 
Mitsubishi Chemical Corporation
 patents
4. 3 out of 2,874 
 
Hitachi-high-technologies Corporation
 patents
5. 1 out of 1,309 
 
Japan Science and Technology Agency
 patents
6. 1 out of 50 
 
University Public Corporation Osaka
 patents
where one patent can have more than one assignee

Years Active: 2005-2023

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29 patents (USPTO):
1. 11597896 - Cleaning liquid, cleaning method, and method for producing semiconductor wafer (2023-03-07),
2. 11551907 - Electron microscope and sample observation method using the same (2023-01-10),
3. 11149231 - Cleaning liquid, cleaning method, and method for producing semiconductor wafer (2021-10-19),
4. 11066627 - Cleaning agent composition for semiconductor device substrate, method of cleaning semiconductor device substrate, method of manufacturing semiconductor device substrate, and semiconductor device substrate (2021-07-20),
5. 11024482 - Holography reconstruction method and program (2021-06-01),
6. 11011344 - Interferometric electron microscope (2021-05-18),
7. 10948426 - Particle beam device, observation method, and diffraction grating (2021-03-16),
8. 10770264 - Interference optical system unit, charged particle beam interference apparatus, and method for observing charged particle beam interference image (2020-09-08),
9. 10535497 - Electron microscope and imaging method (2020-01-14),
10. 10210962 - Charged particle beam device, optical device, irradiation method, diffraction grating system, and diffraction grating (2019-02-19),
11. 10113141 - Cleaning liquid for semiconductor device and method for cleaning substrate for semiconductor device (2018-10-30),
12. 9864114 - Zone plate having annular or spiral shape and Y-shaped branching edge dislocation (2018-01-09),
13. 9679738 - Electron microscope (2017-06-13),
14. 9365802 - Cleaning liquid for semiconductor device substrates and method of cleaning substrate for semiconductor devices (2016-06-14),
15. 8946628 - Electron beam interference device and electron beam interferometry (2015-02-03),

Title: Ken Harada: Pioneering Inventor from Wako, JP

Introduction: Ken Harada is a distinguished inventor hailing from Wako, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Ken Harada holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his continuous commitment to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Ken Harada has worked with leading tech companies in Japan, spearheading research and development projects that have led to significant technological breakthroughs in various industries.

Collaborations: Throughout his career, Ken Harada has collaborated with top researchers, engineers, and scientists both locally and internationally, fostering a culture of innovation and knowledge exchange that has been instrumental in his success as an inventor.

Conclusion: Ken Harada's relentless pursuit of innovation and his passion for creating technology that makes a difference have solidified his reputation as a visionary inventor in the global tech community.

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