Kazuo Kohmura

USPTO Granted Patents = 38 (Patent Applications = 6)

EPO Patents = 11 (Patent Applications = 20)

Average Co-Inventor Count = 3.9

ph-index = 4

Forward Citations = 49(Granted Patents)

Location History:

Sodegaura, JP (2005 - 2012)
Minato-ku, JP (2010 - 2012)
Tokyo, JP (2012)
Ichihara, JP (2012 - 2013)
Yamaguchi, JP (2017)
Iwakuni, JP (2015 - 2018)
Chiba, JP (2013 - 2024)

Company Filing History:

30 out of 1,788

Mitsui Chemicals, Inc.

Nippon Light Metal Company, Ltd.

patents

5. 2 out of 1,715

National Institute of Advanced Industrial Science and Technology

Sanyo Electric Co., Ltd.

Mitsu Chemicals, Inc.

patents

where one patent can have more than one assignee

Years Active: 2005-2025

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38 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12474630 - Pellicle demounting method and pellicle demounting preprocessing device (2025-11-18),

2. 12287569 - Pellicle film for photolithography, pellicle, photolithography mask, photolithography system, and method of producing pellicle film for photolithography (2025-04-29),

3. 12271109 - Pellicle demounting method, and pellicle demounting device (2025-04-08),

4. 11859110 - Substrate laminated body and method of manufacturing substrate laminated body (2024-01-02),

5. 11852968 - Pellicle, exposure master, exposure device and method for manufacturing semiconductor device (2023-12-26),

6. 11581197 - Method for producing semiconductor device and intermediate for semiconductor device (2023-02-14),

7. 11332643 - Adhesive member and production method for adhesive member (2022-05-17),

8. 11243463 - Supporting frame for pellicle, pellicle, method for manufacturing same, exposure master using same, and method for manufacturing semiconductor device (2022-02-08),

9. 11204547 - Pellicle support frame, pellicle, method for manufacturing pellicle support frame, and exposure original plate and exposure device employing pellicle (2021-12-21),

10. 11137677 - Pellicle, exposure original plate, exposure device, and semiconductor device manufacturing method (2021-10-05),

11. 11042085 - Pellicle film, pellicle frame, pellicle, method for producing same, original plate for light exposure, light exposure apparatus and method for manufacturing semiconductor device (2021-06-22),

12. 10988647 - Semiconductor substrate manufacturing method, semiconductor device, and method for manufacturing same (2021-04-27),

13. 10955740 - Pellicle frame and pellicle (2021-03-23),

14. 10895805 - Pellicle manufacturing method and method for manufacturing photomask with pellicle (2021-01-19),

15. 10606169 - Pellicle frame, pellicle containing same, method for producing pellicle frame, and method for producing pellicle (2020-03-31),

Title: Kazuo Kohmura - Pioneering Inventor from Chiba, Japan

Introduction: Kazuo Kohmura is a distinguished inventor hailing from Chiba, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Kazuo Kohmura holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his continuous commitment to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Kazuo Kohmura has worked with leading tech companies in Japan, spearheading research and development projects that have led to significant technological breakthroughs. His innovative solutions have not only revolutionized industries but have also improved the quality of life for many.

Collaborations: Throughout his career, Kazuo Kohmura has collaborated with top researchers, engineers, and scientists both locally and internationally. These collaborations have been instrumental in the success of his projects, fostering a culture of innovation and knowledge exchange.

Conclusion: Kazuo Kohmura's relentless passion for innovation, coupled with his exceptional technical skills, has solidified his reputation as a visionary inventor in the tech industry. His contributions continue to inspire future generations of inventors and shape the landscape of technological advancements globally.

This text is generated by artificial intelligence and may not be accurate.