The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2021
Filed:
Aug. 08, 2019
Mitsui Chemicals, Inc., Tokyo, JP;
Kazuo Kohmura, Chiba, JP;
Yosuke Ono, Sodegaura, JP;
Atsushi Okubo, Itabashi, JP;
Daiki Taneichi, Chiba, JP;
Hisako Ishikawa, Ichihara, JP;
Tsuneaki Biyajima, Otake, JP;
MITSUI CHEMICALS, INC., Tokyo, JP;
Abstract
A pellicle for EUV exposure that has a high transmittance to EUV light, causes little outgassing, and is not much contaminated, and a method for manufacturing the same are provided. A pellicle () includes a pellicle film (); a support frame (); and a first adhesive layer () provided at an end of the support frame, the end being opposite to an end on which the pellicle film is extended. The pellicle further includes an inorganic layer () on a side surface of the first adhesive layer, the side surface extending in a direction crossing a surface of the pellicle film, and the pellicle film being extended on the side surface. The inorganic layer has a mass absorption coefficient (μ) in the range of 5×10cm/g to 2×10cm2/g.