Atsushi Okubo

This inventor holds 58 USPTO granted patents and 16 published patent applications and 20 EPO patents, primarily in Photolithography Technology (CPC class F28F). Top assignees: Sony Corporation, Mitsui Chemicals, Inc., T.rad Co., Ltd.. Active years: 2000-2026.

USPTO Granted Patents = 58 (Patent Applications = 16)

% Patents Active = 67.2

EPO Patents = 20 (Patent Applications = 28)

Average Co-Inventor Count = 2.9

ph-index = 8

Forward Citations = 357(Granted Patents)

Forward Citations (Not Self Cited) = 350(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Sodegaura, JP (2000 - 2002)
Sogegaura, JP (2003)
Kanagawa, JP (2004)
Itabashi, JP (2017 - 2021)
Tokyo, JP (2007 - 2023)

Company Filing History:

Mitsui Chemicals, Inc.

Asahi Kasei Chemicals Corporation

patents

5. 2 out of 1,762

National Institute of Advanced Industrial Science and Technology

patents

6. 1 out of 993

Asahi Kasei Kabushiki Kaisha

patents

where one patent can have more than one assignee

Years Active: 2000-2026

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Areas of Expertise:

Pellicle

Photolithography

Semiconductor Device

Heat Exchanger

Image Processing

Authentication

Polyimide

Learning Device

Information Processing

Heat Sink

N-Substituted Carbamic Acid

Exposure Device

58 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12607925 - Pellicle, exposure original plate, exposure device, method of manufacturing pellicle, and method of manufacturing semiconductor device (2026-04-21),

2. 12287569 - Pellicle film for photolithography, pellicle, photolithography mask, photolithography system, and method of producing pellicle film for photolithography (2025-04-29),

3. 12259201 - Header plates structure of heat exchanger (2025-03-25),

4. 11852968 - Pellicle, exposure master, exposure device and method for manufacturing semiconductor device (2023-12-26),

5. 11740027 - Stacked plate heat exchanger (2023-08-29),

6. 11416591 - Electronic apparatus, authentication method, and program (2022-08-16),

7. 11373437 - Image processing device, image processing method, and program (2022-06-28),

8. 11243463 - Supporting frame for pellicle, pellicle, method for manufacturing same, exposure master using same, and method for manufacturing semiconductor device (2022-02-08),

9. 11204547 - Pellicle support frame, pellicle, method for manufacturing pellicle support frame, and exposure original plate and exposure device employing pellicle (2021-12-21),

10. 11137677 - Pellicle, exposure original plate, exposure device, and semiconductor device manufacturing method (2021-10-05),

11. 11105559 - Drawn cup-type heat exchanger (2021-08-31),

12. 11042085 - Pellicle film, pellicle frame, pellicle, method for producing same, original plate for light exposure, light exposure apparatus and method for manufacturing semiconductor device (2021-06-22),

13. 10976110 - Plate laminate type heat exchanger (2021-04-13),

14. 10837718 - Laminated core type heat sink (2020-11-17),

15. 10801831 - Speckle measurement apparatus and speckle measurement method (2020-10-13),

Title: Atsushi Okubo: Innovator in Semiconductor Manufacturing and Heat Exchange Technology

Introduction

Atsushi Okubo is a prominent inventor based in Tokyo, Japan, recognized for his contributions to semiconductor manufacturing technologies and heat exchange solutions. With an impressive portfolio of 55 patents, Okubo has established himself as a leading figure in innovation and technology development.

Latest Patents

Among his latest patents, Okubo has developed several noteworthy technologies. One of his significant inventions is a pellicle designed to suppress outgassing from an adhesive layer. This pellicle consists of a pellicle film, a support frame, and a complex arrangement of adhesive and inorganic material layers, optimizing the manufacturing process of semiconductor devices. Another crucial innovation is a stacked plate heat exchanger that addresses the issue of thermal stress concentration. This invention includes a flow-volume limiting portion with opening features that aim to reduce rigidity differences, thereby enhancing the durability and effectiveness of the heat exchanger.

Career Highlights

Atsushi Okubo has an impressive career working with leading companies, notably Sony Corporation and Mitsui Chemicals, Inc. His experience within these organizations has played a significant role in shaping his innovative capabilities, allowing him to develop solutions that are not only groundbreaking but also practical for industrial applications.

Collaborations

Throughout his career, Okubo has collaborated with talented professionals, including Taiji Sakai and Takuya Bungo. Their combined expertise has contributed to the successful development and refinement of cutting-edge technologies.

Conclusion

Atsushi Okubo continues to push the boundaries of innovation within the semiconductor and heat exchange sectors. His patents reflect a commitment to enhancing technological processes, ultimately benefiting the industries he serves. As a respected inventor, Okubo's work demonstrates the importance of innovation in advancing modern technology.