The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2025
Filed:
Apr. 02, 2021
Mitsui Chemicals, Inc., Tokyo, JP;
National Institute of Advanced Industrial Science and Technology, Tokyo, JP;
Yousuke Ono, Sodegaura, JP;
Hisako Ishikawa, Ichihara, JP;
Ryohei Ogawa, Ichihara, JP;
Atsushi Okubo, Tokyo, JP;
Kazuo Kohmura, Iwakuni, JP;
Atsuko Sekiguchi, Tsukuba, JP;
Yuichi Kato, Tsukuba, JP;
Takeo Yamada, Tsukuba, JP;
Ying Zhou, Tsukuba, JP;
MITSUI CHEMICALS, INC., Tokyo, JP;
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY, Tokyo, JP;
Abstract
A pellicle film for photolithography including a carbon nanotube film, in which the carbon nanotube film contains carbon nanotubes; the carbon nanotube film transmits 80% or more of EUV light at a wavelength of 13.5 nm; the carbon nanotube film has a thickness from 1 nm to 50 nm; the carbon nanotube film is deposited on a silicon substrate, in which the 3σ of the reflectance is 15% or less when the reflectance of the deposited carbon nanotube film is measured using a reflectance spectrophotometer-based film thickness meter under the following conditions: the diameter of measurement spots, 20 μm; the reference measurement wavelength, 285 nm; the number of measurement spots, 121 spots; the distance between the centers of adjacent measurement spots, 40 μm.