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Years Active: 2024-2025
Title: Yousuke Ono: Innovator in Photolithography Technology
Introduction
Yousuke Ono is a prominent inventor based in Sodegaura, Japan. He has made significant contributions to the field of photolithography, particularly through his innovative patents. With a total of two patents to his name, Ono's work focuses on enhancing the efficiency and effectiveness of photolithography systems.
Latest Patents
Ono's latest patents include a pellicle film for photolithography, which features a carbon nanotube film. This film is designed to transmit 80% or more of extreme ultraviolet (EUV) light at a wavelength of 13.5 nm. The carbon nanotube film has a thickness ranging from 1 nm to 50 nm and is deposited on a silicon substrate. The reflectance of the deposited film is measured to ensure it meets strict criteria, with a 3σ of 15% or less. Another patent involves a pellicle that includes a carbon-based membrane with a carbon content of 40% by mass or more, supported by a frame that meets specific roughness and unevenness conditions.
Career Highlights
Throughout his career, Yousuke Ono has worked with notable organizations such as Mitsui Chemicals, Inc. and the National Institute of Advanced Industrial Science and Technology. His experience in these companies has allowed him to develop and refine his innovative ideas in photolithography.
Collaborations
Ono has collaborated with talented individuals in his field, including Hisako Ishikawa and Ryohei Ogawa. These partnerships have contributed to the advancement of his research and the successful development of his patents.
Conclusion
Yousuke Ono's contributions to photolithography technology through his innovative patents demonstrate his expertise and commitment to advancing the field. His work continues to influence the industry and pave the way for future developments.