The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2021
Filed:
Jun. 30, 2017
Nippon Light Metal Company, Ltd., Tokyo, JP;
Mitsui Chemicals, Inc., Tokyo, JP;
NIPPON LIGHT METAL COMPANY, LTD., Tokyo, JP;
Mitsui Chemicals, Inc., Tokyo, JP;
Abstract
The present invention provides; a pellicle frame which can effectively inhibit distortion of the photo mask () caused by mounting the pellicle (), and which does not have a complex shape, and a pellicle which uses said pellicle frame are provided, and a manufacturing method of a blackened pellicle frame is also provided which can reduce the defect of the surface flickering under concentrated light and which facilitates inspection of the foreign matter adhesion prior to use. The present invention relates to a pellicle frame with an anodized film on a surface of an aluminum alloy frame, characterized in that: the aluminum alloy frame comprises an aluminum alloy which contains Ca: 5.0 to 10.0% by mass with the remainder aluminum and unavoidable impurities are contained, and has an area (volume) ratio of an AlCa phase, which is a dispersed phase, is greater than or equal to 25%, and a crystal structure of a part of the AlCa phase is monoclinic; wherein the AlCa phase dispersed in the anodized film is anodized, and the anodized film is stained with a black dye.