The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2025
Filed:
Dec. 10, 2020
Mitsui Chemicals, Inc., Tokyo, JP;
Akira Ishikawa, Ichihara, JP;
Kazuo Kohmura, Chiba, JP;
MITSUI CHEMICALS, INC., Tokyo, JP;
Abstract
The disclosure addresses provision of a pellicle demounting method having excellent property with respect to reduction of contamination of a photomask. A method of demounting a pellicle, the method is provided which includes: providing a stack including a photomask, a pellicle frame, and a pellicle film that are arranged in this order; providing an electrode; and a demounting step including disposing the stack and the electrode such that the pellicle film in the stack and the electrode face each other, and applying a voltage to the electrode to generate an electrostatic attractive force, which attracts the pellicle film in a direction toward the electrode, thereby demounting the pellicle film from the photomask in the stack.