Kanagawa-ken, Japan

Karl Hornik


Average Co-Inventor Count = 3.6

ph-index = 3

Forward Citations = 29(Granted Patents)


Location History:

  • Kamakuru, JP (2004)
  • Kanagawa, JP (2005)
  • Hopewell Junction, NY (US) (2007)
  • Kanagawa-ken, JP (2004 - 2008)
  • Laaber, DE (2010)

Company Filing History:


Years Active: 2004-2010

where 'Filed Patents' based on already Granted Patents

13 patents (USPTO):

Title: The Innovative Contributions of Karl Hornik

Introduction

Karl Hornik is a notable inventor based in Kanagawa-ken, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 13 patents. His work focuses on minimizing damage during plasma processing and developing advanced capacitor technologies.

Latest Patents

One of Hornik's latest patents is aimed at minimizing low-k dielectric damage during plasma processing. This invention provides a semiconductor device that includes dielectric material and outlines a method of manufacture. The method involves a short flash activation of an interlayer dielectric (ILD) surface, followed by the flow of a precursor such as silane or DEMS over the activated surface. This process selectively protects the ILD surface, making it resistant to plasma processing damage and eliminating the need for a hard mask.

Another significant patent involves the formation of ferrocapacitors and FeRAM devices. In this process, a ferroelectric layer is deposited over an insulator, and during the first etching stage, the ferroelectric material is etched to create openings while leaving the insulating layer intact. A conductive layer is then deposited into these openings, forming electrodes on the sides. This innovative approach allows for the creation of vertical ferrocapacitors without insulating fences between the electrodes.

Career Highlights

Karl Hornik has worked with prominent companies in the semiconductor industry, including Infineon Technologies AG and Infineon AG. His experience in these organizations has contributed to his expertise in developing cutting-edge technologies.

Collaborations

Throughout his career, Hornik has collaborated with notable professionals such as Ulrich Egger and Rainer Bruchhaus. These collaborations have further enhanced his innovative capabilities and contributions to the field.

Conclusion

Karl Hornik's work in semiconductor technology showcases his innovative spirit and dedication to advancing the industry. His patents reflect a commitment to improving device performance and reliability. His contributions will continue to influence the field for years to come.

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