Balzers, Liechtenstein

Jurgen Weichart

This inventor holds 14 USPTO granted patents and 8 published patent applications, primarily in Plasma Processing. Top assignees: Evatec Ag, Oc Oerlikon Balzers Af, Oc Oerlikon Balzers Ag. Active years: 2010-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jurgen Weichart. Retrieved from https://idiyas.com/inventor/jurgen-weichart

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 14 

% Patents Active = 92.9

Average Co-Inventor Count = 1.5

ph-index = 2

Forward Citations = 23(Granted Patents)


Company Filing History:


Years Active: 2010-2023

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Areas of Expertise:
Degassing Substrates
RF Capacitive Coupled Etch Reactor
Vacuum Plasma Treatment
High Power Impulse Magnetron Sputtering
Magnetron Coated Substrates
Three-Dimensional Wafer Packaging
Substrate Bias
Processing Gas
Vacuum Treatment Chamber
Etch Reactor
Substrate Processing
Layer Deposition
14 patents (USPTO):Explore Patents

Title: Jurgen Weichart: Innovator in Thermal Processing Technologies

Introduction

Jurgen Weichart is a notable inventor based in Balzers, Liechtenstein, recognized for his contributions to thermal processing technologies. With a total of 14 patents to his name, Weichart has made significant advancements in the field, particularly in the design of heating and cooling chambers.

Latest Patents

Among his latest innovations is the "Chamber for Degassing Substrates." This invention features a heater and/or cooler chamber that includes a heat storage block with multiple parallel, stacked slit pockets. Each pocket is designed to accommodate a single plate-shaped workpiece, allowing for efficient heat transfer. The workpiece handling openings are managed by a door arrangement, ensuring that the workpieces are snugly surrounded for optimal thermal management. Another significant patent is the "RF Capacitive Coupled Etch Reactor." In this design, the surface area of the larger electrode is increased by a plate that shares the same electric potential, which is immersed in the plasma space. This configuration allows for controlled etching effects on substrates placed on the smaller electrode.

Career Highlights

Jurgen Weichart has worked with prominent companies in the industry, including Evatec AG and Oerlikon Balzers AG. His experience in these organizations has contributed to his expertise in developing innovative thermal processing solutions.

Collaborations

Throughout his career, Weichart has collaborated with talented individuals such as Johannes Weichart and Stanislav Kadlec, further enhancing his innovative capabilities.

Conclusion

Jurgen Weichart's contributions to thermal processing technologies through his patents and collaborations highlight his role as a significant inventor in the field. His work continues to influence advancements in heating and cooling systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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