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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11469085 B1

PDFFull Text
Date of Patent:
Oct. 11, 2022

Filed:

Oct. 17, 2017

Vacuum plasma workpiece treatment apparatus

Applicant:

Evatec Ag, Trubbach, CH;

Inventors:

Jurgen Weichart, Balzers, LI;

Johannes Weichart, Balzers, LI;

Assignee:

EVATEC AG, Trübbach, CH;

Attorney:

Pearne & Gordon LLP

Primary Examiner:

Sylvia Macarthur

Assistant Examiner:

Michelle Crowell

Int. Cl.
CPC ...
C23C 16/00 (2006.01); H01L 21/00 (2006.01); H01J 37/32 (2006.01); C23C 16/46 (2006.01); C23C 14/35 (2006.01); C23C 16/44 (2006.01); H01L 21/263 (2006.01); H01L 21/3065 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32834 (2013.01); C23C 14/35 (2013.01); C23C 16/4412 (2013.01); C23C 16/466 (2013.01); H01J 37/32091 (2013.01); H01J 37/32165 (2013.01); H01J 37/32174 (2013.01); H01J 37/32183 (2013.01); H01J 37/32568 (2013.01); H01J 37/32724 (2013.01); H01J 37/32816 (2013.01); H01L 21/2633 (2013.01); H01L 21/3065 (2013.01); H01L 21/67069 (2013.01); H01J 2237/002 (2013.01); H01J 2237/3341 (2013.01);
Abstract

In a plasma reactor a pumping compartment is separate from a plasma-treating compartment by a structure which includes a central frame. The frame is suspended to the casing of the reactor via spokes. The spokes allow free expansion and contraction of the frame under thermal loading. The slits between the spokes do not allow plasma ignition there and provide for a small flow resistance between the treatment compartment and the pumping compartment. The frame may act as a downholding member for a substrate on the smaller electrode.

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Weichart, Jurgen. (2022). Vacuum plasma workpiece treatment apparatus (U.S. Patent No. 11469085). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11469085

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