The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2022
Filed:
Oct. 17, 2017
Applicant:
Evatec Ag, Trubbach, CH;
Inventors:
Jurgen Weichart, Balzers, LI;
Johannes Weichart, Balzers, LI;
Assignee:
EVATEC AG, Trübbach, CH;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/46 (2006.01); C23C 14/35 (2006.01); C23C 16/44 (2006.01); H01L 21/263 (2006.01); H01L 21/3065 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32834 (2013.01); C23C 14/35 (2013.01); C23C 16/4412 (2013.01); C23C 16/466 (2013.01); H01J 37/32091 (2013.01); H01J 37/32165 (2013.01); H01J 37/32174 (2013.01); H01J 37/32183 (2013.01); H01J 37/32568 (2013.01); H01J 37/32724 (2013.01); H01J 37/32816 (2013.01); H01L 21/2633 (2013.01); H01L 21/3065 (2013.01); H01L 21/67069 (2013.01); H01J 2237/002 (2013.01); H01J 2237/3341 (2013.01);
Abstract
In a capacitively coupled etch reactor, in which the smaller electrode is etched, the larger electrode is electrically supplied by a very high frequency supply signal and by a high frequency supply signal. The smaller electrode, acting as a substrate carrier, is connected to ground potential.
Quick Actions:
Weichart, Jurgen. (2022). Rf capacitive coupled dual frequency etch reactor (U.S. Patent No. 11217434). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11217434
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