The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2023
Filed:
Oct. 17, 2017
Applicant:
Evatec Ag, Trubbach, CH;
Inventors:
Johannes Weichart, Balzers, LI;
Jurgen Weichart, Balzers, LI;
Assignee:
EVATEC AG, Trubbach, CH;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01J 37/32 (2006.01); C23C 16/46 (2006.01); C23C 14/35 (2006.01); C23C 16/44 (2006.01); H01L 21/263 (2006.01); H01L 21/3065 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32834 (2013.01); C23C 14/35 (2013.01); C23C 16/4412 (2013.01); C23C 16/466 (2013.01); H01J 37/32091 (2013.01); H01J 37/32165 (2013.01); H01J 37/32174 (2013.01); H01J 37/32183 (2013.01); H01J 37/32568 (2013.01); H01J 37/32724 (2013.01); H01J 37/32816 (2013.01); H01L 21/2633 (2013.01); H01L 21/3065 (2013.01); H01L 21/67069 (2013.01); H01J 2237/002 (2013.01); H01J 2237/3341 (2013.01);
Abstract
In a capacitive coupled etch reactor, in which the smaller electrode is predominantly etched, the surface of the larger electrode is increased by a body e.g. a plate, which is on the same electric potential as the larger electrode and which is immersed in the plasma space. A pattern of openings in which plasma may burn is provided in the body so as to control the distribution of the etching effect on a substrate placed on the smaller electrode.