The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 15, 2010

Filed:

Jan. 13, 2004
Applicant:

Jurgen Weichart, Balzers, LI;

Inventor:

Jurgen Weichart, Balzers, LI;

Assignee:

OC Oerlikon Balzers AG, Balzers, LI;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); C23C 16/00 (2006.01); C23C 14/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention relates to an installation, in particular a vacuum processing installation for processing a substrate (), in particular a semiconductor wafer, comprising a processing station. Said installation comprises a frame (), to which is clamped a carrier (), for holding and/or transporting the substrate (), whereby the latter () can be fastened by its entire surface to said carrier (). The processing station preferably comprises a chuck electrode () with a flat outer surface () and the carrier () can be positioned parallel and adjacent to said outer surface () of the chuck electrode (). The carrier is composed in particular of a non-conductive dielectric material and is provided on one side with a conductive layer (), in such a way that the chuck electrode () and the carrier () form an electrostatic chuck.


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