Brookfield, CT, United States of America

Jun Liu

USPTO Granted Patents = 14 

 

Average Co-Inventor Count = 4.7

ph-index = 5

Forward Citations = 97(Granted Patents)


Location History:

  • Brookfield, CT (US) (2007 - 2021)
  • Newtown, CT (US) (2021 - 2023)

Company Filing History:


Years Active: 2007-2023

where 'Filed Patents' based on already Granted Patents

14 patents (USPTO):

Title: Innovations and Contributions of Inventor Jun Liu

Introduction

Jun Liu is a prominent inventor based in Brookfield, CT (US), known for his significant contributions to the field of microelectronics. With a total of 14 patents to his name, Liu has developed innovative cleaning compositions and methods that enhance the performance and reliability of microelectronic devices.

Latest Patents

Among his latest patents, Liu has introduced a cleaning composition for post-CMP (Chemical Mechanical Polishing) cleaning of cobalt substrates. This composition effectively removes residue and contaminants from microelectronic devices, utilizing a combination of complexing agents, cleaning additives, pH adjusting agents, water, and oxylamine compounds. The effectiveness of this composition lies in its ability to clean cobalt-containing substrates while maintaining cobalt compatibility. Another notable patent involves a cleaning composition with a corrosion inhibitor, designed to clean in-process microelectronic device substrates. This composition is particularly effective for surfaces that include exposed metals such as cobalt and copper, along with dielectric materials, ensuring that corrosion of the exposed metals is inhibited during the cleaning process.

Career Highlights

Throughout his career, Jun Liu has worked with leading companies in the microelectronics industry, including Entegris, Inc. and Advanced Technology Materials, Inc. His work has significantly impacted the development of cleaning technologies that are essential for maintaining the integrity of microelectronic devices.

Collaborations

Liu has collaborated with notable professionals in his field, including Elizabeth Thomas and Jeffrey A. Barnes. These collaborations have contributed to the advancement of cleaning technologies and the overall improvement of microelectronic device manufacturing processes.

Conclusion

Jun Liu's innovative contributions to the field of microelectronics, particularly in cleaning compositions and methods, have established him as a key figure in the industry. His patents reflect a commitment to enhancing the performance and reliability of microelectronic devices, making a lasting impact on the field.

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