The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 21, 2021

Filed:

Oct. 21, 2019
Applicant:

Entegris, Inc., Billerica, MA (US);

Inventors:

Daniela White, Ridgefield, CT (US);

Michael White, Ridgefield, CT (US);

Jun Liu, Newtown, CT (US);

Elizabeth Thomas, New Milford, CT (US);

Assignee:

ENTEGRIS, INC., Billerica, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 7/32 (2006.01); C11D 11/00 (2006.01); C11D 3/00 (2006.01); C11D 3/30 (2006.01); B08B 3/08 (2006.01); C11D 1/62 (2006.01); C11D 1/58 (2006.01); C11D 1/90 (2006.01); H01L 21/02 (2006.01); C11D 3/28 (2006.01);
U.S. Cl.
CPC ...
C11D 11/0047 (2013.01); B08B 3/08 (2013.01); C11D 1/58 (2013.01); C11D 1/62 (2013.01); C11D 1/90 (2013.01); C11D 3/0047 (2013.01); C11D 3/0073 (2013.01); C11D 3/28 (2013.01); C11D 3/30 (2013.01); H01L 21/02057 (2013.01);
Abstract

The disclosure generally relates to a composition and process for cleaning residue and/or contaminants from microelectronic devices having said residue and contaminants thereon. The residue may include post-CMP, post-etch, and/or post-ash residue. The compositions and methods are particularly advantageous when cleaning a microelectronic surface comprising copper, low-k dielectric materials, and barrier materials comprising at least one of tantalum-containing material, cobalt-containing material, tantalum-containing, tungsten-containing, and ruthenium-containing material.


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