The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 19, 2021

Filed:

Jul. 18, 2019
Applicant:

Entegris, Inc., Billerica, MA (US);

Inventors:

Daniela White, Ridgefield, CT (US);

Elizabeth Thomas, New Milford, CT (US);

Jun Liu, Newtown, CT (US);

Michael White, Ridgefield, CT (US);

Chao-Yu Wang, Zhubei, TW;

Donald Frye, Sherman, CT (US);

Assignee:

Entegris, Inc., Billerica, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 7/32 (2006.01); C11D 11/00 (2006.01); C11D 7/50 (2006.01); H01L 21/02 (2006.01); C11D 7/34 (2006.01);
U.S. Cl.
CPC ...
C11D 11/0047 (2013.01); C11D 7/329 (2013.01); C11D 7/3245 (2013.01); C11D 7/3272 (2013.01); C11D 7/3281 (2013.01); C11D 7/34 (2013.01); C11D 7/5022 (2013.01); H01L 21/02074 (2013.01);
Abstract

A cleaning composition and process for cleaning an in-process microelectronic device substrate, e.g., by post-chemical mechanical polishing (CMP) cleaning, to remove residue from a surface thereof, wherein the cleaning composition may be especially effective for cleaning a substrate surface that includes exposed metal such as cobalt, copper, or both, along with dielectric or low k dielectric material, and wherein the cleaning composition includes corrosion inhibitor to inhibit corrosion of the exposed metal.


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