Jun Lin

Title: The Innovative Contributions of Jun Lin

Introduction

Jun Lin is a prominent inventor based in Yamanashi, Japan. He has made significant contributions to the field of etching technology, holding a total of 10 patents. His work has been instrumental in advancing methods for selectively etching materials, particularly those containing silicon and oxygen.

Latest Patents

One of Jun Lin's latest patents is an etching method and apparatus designed for selectively etching materials that contain silicon and oxygen. This innovative method involves providing a substrate with the material in a chamber and executing a two-phase gas supply process. The first phase involves supplying a basic gas, followed by a second phase where a fluorine-containing gas is introduced. Notably, part of the second phase does not overlap with the first, allowing for effective heating and removal of reaction products generated during the etching process.

Career Highlights

Throughout his career, Jun Lin has worked with notable companies such as Tokyo Electron Limited and Central Glass Company, Limited. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technologies in the semiconductor and glass industries.

Collaborations

Jun Lin has collaborated with several talented individuals in his field, including Koji Takeya and Akifumi Yao. These partnerships have fostered a creative environment that has led to innovative solutions and advancements in etching technology.

Conclusion

Jun Lin's contributions to the field of etching technology are noteworthy and reflect his dedication to innovation. His patents and collaborations highlight his role as a leading inventor in Japan.