The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 2021
Filed:
Mar. 28, 2019
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Susumu Yamauchi, Nirasaki, JP;
Jun Lin, Nirasaki, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3213 (2006.01); H01L 21/768 (2006.01); H01L 21/67 (2006.01); H01L 23/532 (2006.01);
U.S. Cl.
CPC ...
H01L 21/32135 (2013.01); H01L 21/67069 (2013.01); H01L 21/76892 (2013.01); H01L 23/53209 (2013.01);
Abstract
There is provided an etching method including: a first gas supply step of supplying a reducing gas to a workpiece having a metal film formed thereon to reduce a front surface of the metal film, the workpiece being accommodated in at least one processing chamber; and subsequently, a second gas supply step of supplying an oxidizing gas for oxidizing the metal film and an etching gas composed of a β-diketone to etch the oxidized metal film.