The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2020
Filed:
Jan. 10, 2018
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01); H01L 21/677 (2006.01); H01L 21/66 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31111 (2013.01); H01J 37/32935 (2013.01); H01J 37/32963 (2013.01); H01J 37/32972 (2013.01); H01J 37/32981 (2013.01); H01L 21/31116 (2013.01); H01L 21/67253 (2013.01); H01L 21/67748 (2013.01); H01L 22/24 (2013.01); H01L 29/66795 (2013.01);
Abstract
In a substrate processing method for performing predetermined processing on a substrate, which has a processing target film, accommodated in a processing chamber, as a luminous intensity of a predetermined wavelength in an emission spectrum of a plasma generated from a processing gas in the chamber, a luminous intensity of the predetermined wavelength which starts to change when actual processing of the processing target film is started is measured. Then, a processing time of the predetermined processing performed after a moment when the measured luminous intensity of the predetermined wavelength is changed, is set.