Koji Takeya

Title: Koji Takeya: Innovator in Substrate Processing Technologies

Introduction

Koji Takeya is a prominent inventor based in Yamanashi, Japan. He has made significant contributions to the field of substrate processing, holding a total of 8 patents. His work focuses on advanced techniques that enhance the efficiency and effectiveness of semiconductor processing.

Latest Patents

Takeya's latest patents include a substrate processing method and a substrate processing apparatus. In his substrate processing method, he performs predetermined processing on a substrate with a processing target film. This method involves measuring the luminous intensity of a predetermined wavelength in the emission spectrum of plasma generated from a processing gas. The processing time is then set based on changes in the luminous intensity when actual processing begins. Another notable patent is his naturally oxidized film removing method and device. This technique allows for the removal of a natural oxide film on a semiconductor layer containing indium and another element without requiring high temperatures. By using a first etching gas, which is β-diketone, and heating the semiconductor layer, Takeya effectively removes indium oxide at relatively low temperatures.

Career Highlights

Throughout his career, Koji Takeya has worked with notable companies such as Tokyo Electron Limited and Central Glass Company, Limited. His experience in these organizations has contributed to his expertise in semiconductor technologies and substrate processing.

Collaborations

Takeya has collaborated with esteemed colleagues, including Jun Lin and Takashi Fuse. Their combined efforts have further advanced the field of substrate processing and semiconductor technology.

Conclusion

Koji Takeya's innovative work in substrate processing technologies has made a significant impact on the semiconductor industry. His patents reflect a commitment to improving processing methods while maintaining efficiency and effectiveness.