Kazuaki Nishimura

Title: Kazuaki Nishimura: Innovator in Etching Technology

Introduction

Kazuaki Nishimura is a prominent inventor based in Yamanashi, Japan. He has made significant contributions to the field of etching technology, holding a total of eight patents. His innovative approaches have advanced substrate processing methods, making him a notable figure in the industry.

Latest Patents

Nishimura's latest patents include an etching method and an etching device. The etching method involves supplying a first mixed gas containing a β-diketone-containing etching gas and a nitrogen oxide gas to a target with a surface that has both a first metal film containing cobalt, iron, or manganese and a second metal film containing copper. This method allows for the selective etching of the first metal film over the second. Additionally, he has developed a substrate processing method that measures the luminous intensity of a predetermined wavelength in the emission spectrum of plasma generated from a processing gas. This measurement helps in setting the processing time for the target film.

Career Highlights

Throughout his career, Kazuaki Nishimura has worked with notable organizations, including Tokyo Electron Limited and Tohoku University. His experience in these institutions has contributed to his expertise in etching technologies and substrate processing.

Collaborations

Nishimura has collaborated with several professionals in his field, including Jun Lin and Koji Takeya. These collaborations have further enriched his work and innovations.

Conclusion

Kazuaki Nishimura's contributions to etching technology and substrate processing have established him as a key inventor in his field. His patents reflect a commitment to advancing technology and improving processing methods.