The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2022
Filed:
May. 31, 2017
Central Glass Company, Limited, Yamaguchi, JP;
Tokyo Electron Limited, Tokyo, JP;
Akifumi Yao, Yamaguchi, JP;
Kunihiro Yamauchi, Yamaguchi, JP;
Tatsuo Miyazaki, Tokyo, JP;
Jun Lin, Yamanashi, JP;
Susumu Yamauchi, Yamanashi, JP;
Kazuaki Nishimura, Yamanashi, JP;
CENTRAL GLASS COMPANY, LIMITED, Yamaguchi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
The etching method of the present invention includes the step of supplying a first mixed gas containing a β-diketone-containing etching gas and a nitrogen oxide gas to a target having, on a surface, both a first metal film containing cobalt, iron, or manganese and a second metal film containing copper, thereby selectively etching the first metal film over the second metal film, or the step of supplying a second mixed gas containing a β-diketone-containing etching gas and oxygen gas to the target, thereby selectively etching the second metal film over the first metal film.