Tatsuo Miyazaki

Title: Innovations of Tatsuo Miyazaki

Introduction

Tatsuo Miyazaki is a prominent inventor based in Ube, Japan. He has made significant contributions to the field of etching technology, holding a total of seven patents. His work has advanced the methods used in semiconductor manufacturing and material processing.

Latest Patents

Miyazaki's latest patents include an innovative etching method and device. The first patent describes an etching method that involves supplying a first mixed gas containing a β-diketone-containing etching gas and a nitrogen oxide gas to a target. This method allows for the selective etching of a first metal film, which contains cobalt, iron, or manganese, over a second metal film made of copper. The second patent outlines a similar etching method, focusing on etching a cobalt film by supplying an etching gas containing β-diketone and an oxidizing gas. This process is conducted while maintaining the target object at a temperature of 250°C or lower.

Career Highlights

Throughout his career, Tatsuo Miyazaki has worked with notable companies such as Central Glass Company, Limited and Tokyo Electron Limited. His experience in these organizations has contributed to his expertise in etching technologies and semiconductor processes.

Collaborations

Miyazaki has collaborated with several professionals in his field, including Akifumi Yao and Jun Lin. These collaborations have likely enriched his research and development efforts.

Conclusion

Tatsuo Miyazaki's contributions to etching technology and his innovative patents have made a significant impact in the industry. His work continues to influence advancements in semiconductor manufacturing and material processing.